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  Lot # 14.3

Gasonics Aura 2000 LL Plasma Asher

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  • Item ID # 1341410
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Gasonics Aura 2000 LL Downstream Plasma Asher

200mm Wafer Configuration

*Multiple units available* Photos may be representative of an identical parallel system


The Aura 2000 system is a microwave downstream asher used for the removal of resist and other organic materials.  Samples are loaded onto 8” carrier wafers into the system.  Samples can be heated from 100C to above 350C by heat lamps, while being exposed to microwave-cracked oxygen to remove organic materials.  The microwave excitation of the oxygen is done downstream from the chamber and the reactive oxygen flows through a showerhead to expose the sample, thus completely eliminating ion bombardment.  Resist etch rates of several microns per minute can be achieved and is also effective on fluorine and chlorine plasma exposed resist.

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